Bringing the power of bright, coherent extreme ultraviolet light to your lab
XUV Lasers specializes in the development of compact extreme ultraviolet lasers and optical systems. Our desktop-size lasers at 46.9 nm bring to your own laboratory a powerful beam of pulsed, coherent extreme ultraviolet light (also known as XUV or EUV radiation). Its short wavelength, combined with a high energy per pulse (10 µJ) and short pulse duration (1.5 ns) makes it a unique tool for numerous novel applications.
Our EUV laser has been successfully demonstrated in applications such as nanoscale microscopy, single-photon ionization mass spectroscopy studies of the electronic structure and chemical reactivity of clusters and molecules, direct patterning of materials in the nanoscale, and material ablation studies.
Navigate through our site to discover the new and exciting applications of our EUV laser sources.
Short wavelength allows resolution down to 54 nm. The microscope operates in either reflection or transmission modes.
Read more: C. Brewer et al., Opt. Lett. 33, 518 (2008); F. Brizuela et al., Opt. Express 13, 3983 (2005).
Ablation of holes with diameters as small as 82 nm and very clean walls was obtained in poly(methyl methacrylate) focusing pulses from a Ne-like Ar 46.9 nm compact capillary-discharge laser with a freestanding Fresnel zone plate diffracting into third order.
Read more: “Nanometer scale ablation with a table-top soft x-ray laser”, G. Vaschenko et al., Opt. Lett. 31 , 3615, (2006).
High photon energy allows single photon ionization, which avoids molecule and cluster fragmentation.
Read more: S. Heinbuch et al., Journal of the Optical Society of America B 26, B85 (2008); S.G. He et al., J. Phys. Chem A 112, 11067 (2008).