Literature

Higher power tabletop laser - Applications

“Short-wavelength ablation of molecular solids: pulse duration and wavelength effects”, L. Juha et al., J. Microlithography, Microfabrication, and Microsystems 4, 033007, (2005).
“XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses”, L. Juha et al., J. Electron Spectroscopy and Related Phenomena 144, 929, (2005).
“Ablation of organic polymers by 46.9-nm-laser radiation”, L. Juha et al., App. Phys. Lett. 86 , 034109, (2005).
“Nanometer scale ablation with a table-top soft x-ray laser”, G. Vaschenko et al., Opt. Lett. 31 , 3615, (2006).
“Warm Photoionized Plasmas Created by Soft X-Ray Laser Irradiation of Solid Targets”, M. Berrill et al., J. Opt. Soc. Am. B 25 , B32, (2008).

“Application of extremely compact capillary discharge soft x-ray lasers to dense plasma diagnostics”, J.J. Rocca et al., Phys. Plasmas 10 , 2031, (2003).
“Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings”, J. Filevich et al., Opt. Lett. 25, 356, (2000).
“Soft x-ray laser interferometry of colliding laser-created plasmas in semi-cylindrical cavities”, M. Purvis et al., IEEE Trans. Plasma Sci. 36, 1134, (2008).
“Dynamics of a dense laboratory plasma jet investigated using soft x-ray laser interferometry”, J. Grava et al., Phys. Rev. E 78, 016403, (2008).
“Dynamics of converging laser-created plasmas in semi-cylindrical cavities studied using soft x-ray laser interferometry”, M. Purvis et al., Phys. Rev. E 76, 046402, (2007).

“Nanoimaging with a compact extreme-ultraviolet laser”, G. Vaschenko et al., Opt. Lett. 30 , 2095, (2005).
“High Numerical Aperture Table Top Soft X Ray Diffraction Microscopy with 70 nm Resolution”, R.L. Sandberg et al., Proc. Nat. Acad. Sci. 105 , 24, (2008).

“Soft x-ray laser holography with wavelength resolution”, P.W. Wachulak et al., Opt. Soc. Am. B 25 , 1811, (2008).
“Volume extreme ultraviolet nano-holographic imaging with numerical optical sectioning”, P.W. Wachulak et al., Opt. Express 15 , 10622, (2007).
“Sub 400 nm spatial resolution extreme ultraviolet holography with a table top laser”, P.W. Wachulak et al., Opt. Express 14 , 9636, (2006).

“Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with table top EUV lasers”, P.W. Wachulak et al., J. Vac. Sci. Tech. 25, 2094, (2007).
“Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography”, P.W. Wachulak et al., Opt. Express 15 , 3465, (2007).
"Nanopatterning With Interferometric Lithography Using a Compact λ = 46.9-nm Laser”, M.G. Capeluto et al., IEEE Trans. Nanotechnology 5, 3, (2006).

“Determination of XUV Optical Constants by Reflectometry Using a High-Repetition Rate 46.9-nm Laser”, A.V. Vinogradov, IEEE J. Sel. Topics Quantum Electron. 5 , 1495, (1999).
“Characterization of diffraction gratings by use of a tabletop soft x-ray laser”, M. Seminario et al., Appl. Opt. 40, 5539, (2001).
“Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses”, M. Grisham et al., Opt. Lett. 29, 620, (2004).
“Mechanisms of radiation damage to Sc/Si multilayer mirrors under EUV laser irradiation”, Y.P. Pershyn et al., J. Phys. D: Appl. Phys. 42 , 125407, (2009).