Higher power tabletop laser - Applications
Ablation
- “Short-wavelength ablation of molecular solids: pulse duration and wavelength effects”, L. Juha et al., J. Microlithography, Microfabrication, and Microsystems 4, 033007, (2005).
- “XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses”, L. Juha et al., J. Electron Spectroscopy and Related Phenomena 144, 929, (2005).
- “Ablation of organic polymers by 46.9-nm-laser radiation”, L. Juha et al., App. Phys. Lett. 86 , 034109, (2005).
- “Nanometer scale ablation with a table-top soft x-ray laser”, G. Vaschenko et al., Opt. Lett. 31 , 3615, (2006).
- “Warm Photoionized Plasmas Created by Soft X-Ray Laser Irradiation of Solid Targets”, M. Berrill et al., J. Opt. Soc. Am. B 25 , B32, (2008).
Plasma diagnosis
- “Application of extremely compact capillary discharge soft x-ray lasers to dense plasma diagnostics”, J.J. Rocca et al., Phys. Plasmas 10 , 2031, (2003).
- “Dense plasma diagnostics with an amplitude-division soft-x-ray laser interferometer based on diffraction gratings”, J. Filevich et al., Opt. Lett. 25, 356, (2000).
- “Soft x-ray laser interferometry of colliding laser-created plasmas in semi-cylindrical cavities”, M. Purvis et al., IEEE Trans. Plasma Sci. 36, 1134, (2008).
- “Dynamics of a dense laboratory plasma jet investigated using soft x-ray laser interferometry”, J. Grava et al., Phys. Rev. E 78, 016403, (2008).
- “Dynamics of converging laser-created plasmas in semi-cylindrical cavities studied using soft x-ray laser interferometry”, M. Purvis et al., Phys. Rev. E 76, 046402, (2007).
Imaging
Holography
- “Soft x-ray laser holography with wavelength resolution”, P.W. Wachulak et al., Opt. Soc. Am. B 25 , 1811, (2008).
- “Volume extreme ultraviolet nano-holographic imaging with numerical optical sectioning”, P.W. Wachulak et al., Opt. Express 15 , 10622, (2007).
- “Sub 400 nm spatial resolution extreme ultraviolet holography with a table top laser”, P.W. Wachulak et al., Opt. Express 14 , 9636, (2006).
Nanopatterning
- “Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with table top EUV lasers”, P.W. Wachulak et al., J. Vac. Sci. Tech. 25, 2094, (2007).
- “Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography”, P.W. Wachulak et al., Opt. Express 15 , 3465, (2007).
- "Nanopatterning With Interferometric Lithography Using a Compact λ = 46.9-nm Laser”, M.G. Capeluto et al., IEEE Trans. Nanotechnology 5, 3, (2006).
Characterization of optical components and materials
- “Determination of XUV Optical Constants by Reflectometry Using a High-Repetition Rate 46.9-nm Laser”, A.V. Vinogradov, IEEE J. Sel. Topics Quantum Electron. 5 , 1495, (1999).
- “Characterization of diffraction gratings by use of a tabletop soft x-ray laser”, M. Seminario et al., Appl. Opt. 40, 5539, (2001).
- “Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses”, M. Grisham et al., Opt. Lett. 29, 620, (2004).
- “Mechanisms of radiation damage to Sc/Si multilayer mirrors under EUV laser irradiation”, Y.P. Pershyn et al., J. Phys. D: Appl. Phys. 42 , 125407, (2009).
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